au.\*:("NIIBE M")
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NMR RELAXATION OF 7LI IN CONCENTRATED LITHIUM-AMMONIA SOLUTIONSNAKAMURA Y; HIRASAWA M; NIIBE M et al.1980; PHYS. LETT. SECT. A; ISSN 0375-9601; NLD; DA. 1980; VOL. 79; NO 1; PP. 131-132; BIBL. 9 REF.Article
Nuclear magnetic resonance studies of 14N and 1H in metal-ammonia solutionsNIIBE, M; NAKAMURA, Y.Journal of physical chemistry (1952). 1984, Vol 88, Num 23, pp 5608-5614, issn 0022-3654Article
Surface relief associated with isothermal martensite in zirconia-3-mol%-yttria ceramics observed by atomic force microscopyTSUBAKINO, H; KURODA, Y; NIIBE, M et al.Journal of the American Ceramic Society. 1999, Vol 82, Num 10, pp 2921-2923, issn 0002-7820Article
Nuclear magnetic resonance study of sodium-23 in sodium-ammonia solutionsNIIBE, M; NAKAMURA, Y; SHIMOJI, M et al.Journal of physical chemistry (1952). 1984, Vol 88, Num 16, pp 3555-3560, issn 0022-3654Article
AFM study of the surface deformation of austenitic stainless steel irradiated by He+ ionsLIU, L; MITAMURA, T; NIIBE, M et al.Journal of nuclear materials. 2000, Vol 278, Num 1, pp 30-36, issn 0022-3115Article
Optical design for soft X-ray projection lithographyWATANABE, Y; SUZUKI, M; MICHIZUKI, N et al.Japanese journal of applied physics. 1991, Vol 30, Num 11B, pp 3053-3057, issn 0021-4922, 1Article
Proposal of at-wavelength PDI for EUVL optics alignment by using a compact undulatorGOMEI, Y; SUGISAKI, K; ZHU, Y et al.Microelectronic engineering. 2002, Vol 61-62, pp 1077-1082, issn 0167-9317Conference Paper
Influence of the source gas ratio on the hydrogen and deuterium content of a-C:H and a-C:D films: Plasma-enhanced CVD with CH4/H2, CH4/D2, CD4/H2 and CD4/D2OZEKI, K; SEKIBA, D; SUZUKI, T et al.Applied surface science. 2013, Vol 265, pp 750-757, issn 0169-4332, 8 p.Article
The role of ambient hydrocarbon species to reduce oxidation in ru capping layers for EUVL optics mirrorsGOMEI, Yoshio; KAKUTANI, Y; TAKASE, H et al.Microelectronic engineering. 2006, Vol 83, Num 4-9, pp 676-679, issn 0167-9317, 4 p.Conference Paper
Double-pass amplification in Ge soft X-ray laser with a polarizing half-cavityMURAI, K; YUAN, G; MACPHEE, A et al.Japanese journal of applied physics. 1994, Vol 33, Num 4B, pp L600-L603, issn 0021-4922, 2Article
EUV Wavefront Measurement of six-mirror optic using EWMSSUGISAKI, K; OKADA, M; YOKOTA, H et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69212U.1-69212U.9, issn 0277-786X, isbn 978-0-8194-7106-2Conference Paper
Carbon deposition on multi-layer mirrors by extreme ultra violet ray irradiationMATSUNARI, S; AOKI, T; FUKUDA, Y et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65172X.1-65172X.8, issn 0277-786X, isbn 978-0-8194-6636-5Conference Paper
Three-aspherical mirror system for EUV lithographyKINOSHITA, H; WATANABE, T; NIIBE, M et al.SPIE proceedings series. 1998, pp 20-31, isbn 0-8194-2776-4Conference Paper
Fabrication of aspherical mirrors for extreme ultra-violet lithography (EUVL) using deposition techniquesNIIBE, M; WATANABE, T; KINOSHITA, H et al.Japanese journal of applied physics. 1997, Vol 36, Num 12B, pp 7601-7604, issn 0021-4922, 1Conference Paper
A novel design of three-aspherical-mirror imaging optics for extreme ultra-violet lithographyWATANABE, T; MASHIMA, K; NIIBE, M et al.Japanese journal of applied physics. 1997, Vol 36, Num 12B, pp 7597-7600, issn 0021-4922, 1Conference Paper
